Buch Details
This book describes the application of machine learning modelling approaches in atomic layer deposition and presents detailed information on modelling, optimization, and prediction of the behaviour and characteristics of ALD for improved process quality control.
- Schriftsteller Oluwatobi Adeleke, Sina Karimzadeh, Tien-Chien Jen
- ISBN13 9781032386737
- ISBN10 1032386738
- Buchseiten 354
- Jahr der Ausgabe 2025
- Fecha de publicación 06/05/2025
Rezensionen und Bewertungen
Machine Learning-Based Modelling in Atomic Layer Deposition Processes
- Von
- Oluwatobi Adeleke, Sina Karimzadeh, Tien-Chien Jen
- |
- ROUTLEDGE (2025)
- 9781032386737



