Buch Details
This book describes the application of machine learning modelling approaches in atomic layer deposition and presents detailed information on modelling, optimization, and prediction of the behaviour and characteristics of ALD for improved process quality control.
- Schriftsteller Oluwatobi Adeleke, Sina Karimzadeh, Tien-Chien Jen
- ISBN13 9781032386706
- ISBN10 1032386703
- Buchseiten 354
- Jahr der Ausgabe 2023
- Fecha de publicación 01/12/2023
Rezensionen und Bewertungen
Machine Learning-Based Modelling in Atomic Layer Deposition Processes
- Von
- Oluwatobi Adeleke, Sina Karimzadeh, Tien-Chien Jen
- |
- ROUTLEDGE (2023)
- 9781032386706



