Detalls del llibre
The study and application of electronic materials has created an increasing demand for sophisticated and reliable techniques for examining and characterizing these materials. This comprehensive book looks at the area of x-ray diffraction and the modern techniques available for deployment in research, development, and production. It provides the theoretical and practical background for applying these techniques in scientific and industrial materials characterization. The main aim of the book is to map the theoretical and practical background necessary to the study of single crystal materials by means of high-resolution x-ray diffraction and topography. It combines mathematical formalisms with graphical explanations and hands-on practical advice for interpreting data.
Llegir més - Autors BOWEN MCCURDY/KAITLYN MUSTO, Brian K. Tanner
- ISBN13 9780850667585
- ISBN10 0850667585
- Pàgines 264
- Any Edició 1998
- Fecha de publicación 05/02/1998
- Idioma Alemany, Francès
Ressenyes i valoracions
High Resolution X-Ray Diffractometry And Topography (Alemany, Francès)
- De
- BOWEN MCCURDY/KAITLYN MUSTO, Brian K. Tanner
- |
- TAYLOR & F (1998)
- 9780850667585



